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A High Density Hollow Cathode Plasma PECVD Technique for Depositing Films on the Internal Surfaces of Cylindrical Substrates
D. Lusk, T. Casserly, M. Gupta, K. Boinapally, Y. Cao, R. Ramamurti, P. DesaiVolume:
6
Year:
2009
Language:
english
Pages:
1
DOI:
10.1002/ppap.200931011
File:
PDF, 203 KB
english, 2009