Pulsed Plasma Enhanced Chemical Vapor Deposition of Alumina...

Plasma Processes and Polymers 2011 Vol. 8; Iss. 7

Pulsed Plasma Enhanced Chemical Vapor Deposition of Alumina Thin Films: Influence of the Duty Cycle on Structure and Elastic Properties

Stephanos Konstantinidis, Kaiyun Jiang, Aline Roobroek, Fabian Renaux, Jochen M. Schneider
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Volume:
8
Year:
2011
Language:
english
Pages:
7
DOI:
10.1002/ppap.201000185
File:
PDF, 605 KB
english, 2011
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