Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm...

Plasma Processes and Polymers 2011 Vol. 8; Iss. 11

Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group

Ting-Ying Chung, David B. Graves, Florian Weilnboeck, Robert L. Bruce, Gottlieb S. Oehrlein, Mingqi Li, Eric A. Hudson
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Volume:
8
Year:
2011
Language:
english
Pages:
12
DOI:
10.1002/ppap.201100071
File:
PDF, 1.50 MB
english, 2011
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