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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Phase analysis of amplitude binary mask structures
Erdmann, Andreas, Kye, Jongwook, Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Herzig, Hans Peter, vogler, Uwe, Bramati, Arianna, Voelkel, ReinhardVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2219062
File:
PDF, 1.30 MB
english, 2016