Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering
Scholtz, Juliano Sadi, Stryhalski, Joel, Sagás, Julio César, Recco, Abel André Cândido, Mezaroba, Marcello, Fontana, Luís CésarVolume:
3
Language:
english
Journal:
Applied Adhesion Science
DOI:
10.1186/s40563-015-0031-7
Date:
December, 2015
File:
PDF, 1.60 MB
english, 2015