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Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch Chamber
Lynn, Shane A., Macgearailt, Niall, Ringwood, John. V.Volume:
44
Language:
english
Journal:
IFAC Proceedings Volumes
DOI:
10.3182/20110828-6-it-1002.03199
Date:
January, 2011
File:
PDF, 607 KB
english, 2011