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Stress measurement at the interface between a Si substrate and diamond-like carbon/Cr/W films by the electronic backscatter diffraction method
Zhou, Liqi, Xu, Guofu, Li, Xu, Wang, Xinwei, Ren, Lingling, Wang, Aiying, Tao, XingfuVolume:
9
Language:
english
Journal:
Applied Physics Express
DOI:
10.7567/APEX.9.025504
Date:
February, 2016
File:
PDF, 1.24 MB
english, 2016