Neural Network Modeling of Deposition Rate Characteristics of Low Temperature Silicon Nitride Deposited by Inner Two Parallel Coil Inductively Coupled Plasma Chemical Vapor Deposition
Kang, Sungchil, Jeong, Seong-Kyun, Kwon, Kwang-Ho, Park, Kang-BakVolume:
13
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2013.8171
Date:
December, 2013
File:
PDF, 704 KB
english, 2013