Application of Soft Lithography to Metal-Induced Lateral Crystallization of Amorphous Si Thin Films Involving Self-Assembly Monolayers and Atomic Layer Deposition
Kim, Kyu-Hun, Kim, Jeong-Eun, Bae, Seung-Muk, Chung, Taek-Mo, Kim, Chang Gyoun, An, Ki-Seok, Hwang, Jin-HaVolume:
14
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2014.8323
Date:
August, 2014
File:
PDF, 3.63 MB
english, 2014