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Impact of Duty Ratio-Controlled Ion Energy on Surface Roughness of Silicon Nitride Films Deposited Using a SiH4–NH3 Plasma
Kim, Daehyun, Lee, Hwajune, Kim, Byungwhan, Seo, Yong Ho, Yoon, Neung-Goo, Han, DongilVolume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.4389
Date:
July, 2011
File:
PDF, 1.70 MB
english, 2011