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Photoresists based on the poly(hydroxyamines) and poly(hydroxyamino esters)
Kryukov, A. Yu., Vannikov, A. V., Anikeev, A. V., Kostenko, L. I.Volume:
4
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00022a011
Date:
July, 1992
File:
PDF, 462 KB
english, 1992