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Impact of Hard Mask on Reflectivity for Litho-Etch-Litho-Etch Process in Double Patterning Lithography
Kuo, Hung-Fei, Chen, Yu-Ting, Chen, Ying-YouVolume:
10
Language:
english
Journal:
Journal of Computational and Theoretical Nanoscience
DOI:
10.1166/jctn.2013.2743
Date:
March, 2013
File:
PDF, 1.65 MB
english, 2013