Characterization of Implantation Induced Defects in...

Journal of Nanoscience and Nanotechnology 2008 / 03 Vol. 8; Iss. 3

Characterization of Implantation Induced Defects in Si-Implanted SiO2 Film

Hao, Xiaopeng, Zhou, Chunlan, Yu, Runsheng, Wang, Baoyi, Wei, Long
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Volume:
8
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2008.327
Date:
March, 2008
File:
PDF, 165 KB
english, 2008
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