Characteristics of SiO2/Si3N4/SiO2 Stacked-Gate Dielectrics...

Characteristics of SiO2/Si3N4/SiO2 Stacked-Gate Dielectrics Obtained via Atomic-Layer Deposition

Lee, Youn-Seoung, Lee, Yong-Hyuk, Ju, Hyun-Jin, Lee, Won-Jun, Lee, Hee Soo, Rha, Sa-Kyun
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Volume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.4326
Date:
July, 2011
File:
PDF, 3.18 MB
english, 2011
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