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The Effect of Inductively-Coupled-Plasma Reactive Ion Etching Power on the Etching Rate and the Surface Roughness of a Sapphire Substrate
Chang, Chun-Ming, Shiao, Ming-Hua, Chiang, Donyau, Yang, Chin-Tien, Cheng, Chung-Ta, Hsueh, Wen-JengVolume:
14
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2014.9383
Date:
October, 2014
File:
PDF, 1.46 MB
english, 2014