Study of doping uniformity of a 200 kV ion implanter by RBS...

Nuclear Science and Techniques 2016 / 6 Vol. 27; Iss. 3

Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements

Li, Hui, Wang, Ze-Song, Zhang, Sheng-Jun, Pelenovich, Vasiliy O., Ren, Feng, Fu, De-Jun, Liu, Chuan-Sheng, Ai, Zhi-Wei
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Volume:
27
Language:
english
Journal:
Nuclear Science and Techniques
DOI:
10.1007/s41365-016-0058-x
Date:
June, 2016
File:
PDF, 916 KB
english, 2016
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