Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning
Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M., Robinson, Alex P.G., Boden, Stuart A.Volume:
155
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.02.045
Date:
April, 2016
File:
PDF, 2.67 MB
english, 2016