Effect of NO(Si 3 N...

Integrated Ferroelectrics 2001 / 01 Vol. 33; Iss. 1-4

Effect of NO(Si 3 N 4 /SiO 2 ) layers on the electrical properties of mfisfet using SBT (SrBi 2 Ta 2 O 9 ) materials

You, In-Kyu, Lee, Won Jae, Yang, Il-Suk, Yu, Byoung Gon, Cho, Kyoung-Ik, Kim, Shi-Ho
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Volume:
33
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580108222299
Date:
January, 2001
File:
PDF, 698 KB
english, 2001
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