SU8 photoresist as an etch mask for local deep anodic etching of silicon
V. V. Starkov, E. Yu. Gavrilin, J. Konle, H. Presting, A. F. Vyatkin, U. KönigVolume:
197
Year:
2003
Language:
english
Pages:
8
DOI:
10.1002/pssa.200306491
File:
PDF, 835 KB
english, 2003