SU8 photoresist as an etch mask for local deep anodic...

SU8 photoresist as an etch mask for local deep anodic etching of silicon

V. V. Starkov, E. Yu. Gavrilin, J. Konle, H. Presting, A. F. Vyatkin, U. König
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Volume:
197
Year:
2003
Language:
english
Pages:
8
DOI:
10.1002/pssa.200306491
File:
PDF, 835 KB
english, 2003
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