Homoepitaxial growth of high-quality nonpolar ZnO films by MOCVD and evaluation of the homoepitaxial ZnO films by XRD measurement for asymmetric planes
Yasuhiro Kashiwaba, Takami Abe, Akira Nakagawa, Haruyuki Endo, Ikuo Niikura, Yasube KashiwabaVolume:
206
Year:
2009
Language:
english
Pages:
4
DOI:
10.1002/pssa.200881305
File:
PDF, 480 KB
english, 2009