The properties of Ru films deposited by remote plasma...

physica status solidi (a) 2012 Vol. 209; Iss. 2

The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2

Taeyong Park, Dongjin Choi, Hagyoung Choi, Hyeongtag Jeon
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Volume:
209
Year:
2012
Language:
english
Pages:
4
DOI:
10.1002/pssa.201127280
File:
PDF, 405 KB
english, 2012
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