Reduction of thermally grown SiO2 by Al films

Reduction of thermally grown SiO2 by Al films

A. E. Gershinskii, A. A. Khoromenko, F. L. Edelman
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Volume:
25
Year:
1974
Language:
english
Pages:
7
DOI:
10.1002/pssa.2210250234
File:
PDF, 402 KB
english, 1974
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