Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
Lee, Ha-Jin, Park, Jin-Seong, Kwon, Se-HunVolume:
36
Language:
english
Journal:
Journal of Electroceramics
DOI:
10.1007/s10832-016-0015-4
Date:
June, 2016
File:
PDF, 958 KB
english, 2016