Impact of post deposition annealing in O2ambient on...

Journal of Materials Science: Materials in Electronics 2016 / 7 Vol. 27; Iss. 7

Impact of post deposition annealing in O2ambient on structural properties of nanocrystalline hafnium oxide thin film

Pandey, Shilpi, Kothari, Prateek, Sharma, Sunil Kumar, Verma, Seema, Rangra, K. J.
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Volume:
27
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-016-4663-6
Date:
July, 2016
File:
PDF, 1.36 MB
english, 2016
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