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The calculation of secondary defect formation at ion implantation of silicon
N. P. Morozov, D. I. Tetelbaum, P. V. Pavlov, E. I. ZorinVolume:
37
Year:
1976
Language:
english
Pages:
8
DOI:
10.1002/pssa.2210370107
File:
PDF, 411 KB
english, 1976