Some investigation of Si and SiO2 surfaces etched in CF4 or CF4O2 plasma
E. D. Atanasova, K. I. Kirov, B. G. Pantchev, S. S. GeorgievVolume:
59
Year:
1980
Language:
english
Pages:
7
DOI:
10.1002/pssa.2210590253
File:
PDF, 1.50 MB
english, 1980