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Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge
Scopece, Daniele, Döbeli, Max, Passerone, Daniele, Maeder, Xavier, Neels, Antonia, Widrig, Beno, Dommann, Alex, Müller, Ulrich, Ramm, JürgenVolume:
17
Language:
english
Journal:
Science and Technology of Advanced Materials
DOI:
10.1080/14686996.2016.1140308
Date:
January, 2016
File:
PDF, 1.88 MB
english, 2016