Formation of ultrathin oxide films on silicon in RF oxygen...

Formation of ultrathin oxide films on silicon in RF oxygen plasma

E. D. Atanasova, K. I. Kirov, E. I. Kantardjeva
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Volume:
64
Year:
1981
Language:
english
Pages:
8
DOI:
10.1002/pssa.2210640106
File:
PDF, 552 KB
english, 1981
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