The annealing characteristics of arsenic-implanted silicon...

The annealing characteristics of arsenic-implanted silicon investigated at low temperatures

C. Wagner, A. El-Sadek, H.-J. Mechelke
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Volume:
64
Year:
1981
Language:
english
Pages:
8
DOI:
10.1002/pssa.2210640115
File:
PDF, 448 KB
english, 1981
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