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High-speed electron beam annealing of arsenic and gallium implanted silicon
R. Klabes, R. Grötzschel, M. Voelskow, S. Panzer, H. BartschVolume:
64
Year:
1981
Language:
english
Pages:
1
DOI:
10.1002/pssa.2210640164
File:
PDF, 144 KB
english, 1981