Annealing of Implanted Silicon under the Action of...

Annealing of Implanted Silicon under the Action of Microsecond Pulsed TEA-CO2 Laser Radiation

L. Nanu, Doina Bǎrbulescu, I. N. Mihǎilescu, V. Teodorescu, Leona C. Nistor
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Volume:
79
Year:
1983
Language:
english
Pages:
1
DOI:
10.1002/pssa.2210790140
File:
PDF, 172 KB
english, 1983
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