Influence of chlorine implantation on phosphorus...

physica status solidi (a) 1985 Vol. 87; Iss. 1

Influence of chlorine implantation on phosphorus diffusivity and oxidation-induced defects in silicon

A. Armigliato, S. Solmi, C. Donolato, P. Negrini, E. Gabilli, A. Garulli, M. Kittler
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Volume:
87
Year:
1985
Language:
english
Pages:
10
DOI:
10.1002/pssa.2210870121
File:
PDF, 711 KB
english, 1985
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