Properties and structure of silicon oxynitride films obtained in a hydrazine plasma
G. D. Bagkatishvili, R. B. Dzhanelidze, T. V. Eterashvili, D. A. Jishiashvili, E. R. KuteliaVolume:
87
Year:
1985
Language:
english
Pages:
6
DOI:
10.1002/pssa.2210870205
File:
PDF, 439 KB
english, 1985