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[IEEE 2015 73rd Annual Device Research Conference (DRC) - Columbus, OH, USA (2015.6.21-2015.6.24)] 2015 73rd Annual Device Research Conference (DRC) - Subtractive plasma-etch process for patterning high performance ZnO TFTs
Donigan, Thomas, Langley, Derrick, Schuette, Mike, Crespo, Antonio, Walker, Dennis, Tetlak, Steve, Leedy, Kevin, Jessen, GreggYear:
2015
Language:
english
DOI:
10.1109/drc.2015.7175632
File:
PDF, 737 KB
english, 2015