High Temperature Implantation of Silicon by B+ and BF Ions
G. A. Kachurin, I. E. Tyshchenko, L. I. Fedina, E. Wieser, Ch. WeiseVolume:
102
Year:
1987
Language:
english
Pages:
8
DOI:
10.1002/pssa.2211020126
File:
PDF, 575 KB
english, 1987