Nitrogen profile modification in high dose implantation...

Nitrogen profile modification in high dose implantation synthesis of silicon nitride

E. Sobeslavsky, H. U. Jäger, U. Kreissig, W. Skorupa, K. Wollschläger
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Volume:
105
Year:
1988
Language:
english
Pages:
10
DOI:
10.1002/pssa.2211050209
File:
PDF, 545 KB
english, 1988
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