Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle
Ko, Ki-Ho, Mo, Soo-Yeon, Kim, In-Seon, Oh, Hye-KeunVolume:
15
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.15.2.023506
Date:
June, 2016
File:
PDF, 3.03 MB
english, 2016