Dependence of Process Characteristics on Atomic-Step Density in Catalyst-Referred Etching of 4H–SiC(0001) Surface
Okamoto, Takeshi, Sano, Yasuhisa, Tachibana, Kazuma, Arima, Kenta, Hattori, Azusa N., Yagi, Keita, Murata, Junji, Sadakuni, Shun, Yamauchi, KazutoVolume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.3917
Date:
April, 2011
File:
PDF, 4.92 MB
english, 2011