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Ion beam lithography of polycrystalline CaF2 films deposited on silicon
A. Thomas, A. Zehe, B. Schreckenbach, J.-W. Erben, R. GrötzschelVolume:
116
Year:
1989
Language:
english
Pages:
9
DOI:
10.1002/pssa.2211160234
File:
PDF, 639 KB
english, 1989