TEM Study of the Molecular Effect in Phosphorus Implanted...

TEM Study of the Molecular Effect in Phosphorus Implanted Silicon

T. S. Shi, A. De Veirman, J. Van Landuyt, G. Q. Yang, C. L. Lin
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Volume:
120
Year:
1990
Language:
english
Pages:
1
DOI:
10.1002/pssa.2211200247
File:
PDF, 190 KB
english, 1990
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