Properties of SiC on Si Substrate Films Obtained Using the Plasma-Chemical Method
S. I. Vlaskina, A. V. Krasikova, V. E. RodionovVolume:
124
Year:
1991
Language:
english
Pages:
6
DOI:
10.1002/pssa.2211240115
File:
PDF, 253 KB
english, 1991