Deep Plasma Etching of Si in a CBrF3 Plasma through a Submicron Single Layer Electron-Beam Lithographic Mask
J. Huran, A. Horniaková, Š. HašČíkVolume:
132
Year:
1992
Language:
english
Pages:
1
DOI:
10.1002/pssa.2211320232
File:
PDF, 214 KB
english, 1992