Implantation damage and anomalous diffusion of implanted...

Implantation damage and anomalous diffusion of implanted boron in silicon through SiO2 films

L. Kaabi, C. Gontrand, M. Lemiti, B. Balland
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Volume:
138
Year:
1993
Language:
english
Pages:
11
DOI:
10.1002/pssa.2211380109
File:
PDF, 520 KB
english, 1993
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