Implantation damage and anomalous diffusion of implanted boron in silicon through SiO2 films
L. Kaabi, C. Gontrand, M. Lemiti, B. BallandVolume:
138
Year:
1993
Language:
english
Pages:
11
DOI:
10.1002/pssa.2211380109
File:
PDF, 520 KB
english, 1993