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Formation of TiSi2/n + /p-Silicon Junctions by Implantation through Metal Technique
N. M. Ravindra, Ying Wu, B. Shah, W. Savin, T. Fink, R. T. Lareau, R. L. PfefferVolume:
140
Year:
1993
Language:
english
Pages:
11
DOI:
10.1002/pssa.2211400128
File:
PDF, 532 KB
english, 1993