On ion track geometry in the etching process

Radiation Effects and Defects in Solids 1999 / 01 Vol. 147; Iss. 3

On ion track geometry in the etching process

Vacik, J., Cervena, J., Hnatowicz, V., Posta, S., Fink, D., Naramoto, H., Kobayashi, Y., Hirata, K., Strauss, P.
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Volume:
147
Language:
english
Journal:
Radiation Effects and Defects in Solids
DOI:
10.1080/10420159908229007
Date:
January, 1999
File:
PDF, 787 KB
english, 1999
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