Mocvd process model for deposition of complex oxide...

Integrated Ferroelectrics 2001 / 01 Vol. 36; Iss. 1-4

Mocvd process model for deposition of complex oxide ferroelectric thin films

Tompa, G. S., Colibaba-evulet, A., Cuchiaro, J. D., Provost, L. G., Hadnagy, D., Davenport, T., Sun, S., Chu, F., Fox, G., Doppelhammer, R. J., Heubner, G.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
36
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580108015536
Date:
January, 2001
File:
PDF, 2.16 MB
english, 2001
Conversion to is in progress
Conversion to is failed