![](/img/cover-not-exists.png)
Mocvd process model for deposition of complex oxide ferroelectric thin films
Tompa, G. S., Colibaba-evulet, A., Cuchiaro, J. D., Provost, L. G., Hadnagy, D., Davenport, T., Sun, S., Chu, F., Fox, G., Doppelhammer, R. J., Heubner, G.Volume:
36
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580108015536
Date:
January, 2001
File:
PDF, 2.16 MB
english, 2001