Study of Work-Function Variation in High-κ/Metal-Gate...

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IEEE Transactions on Electron Devices 2016

Study of Work-Function Variation in High-κ/Metal-Gate Gate-All-Around Nanowire MOSFET

Nam, Hyohyun, Lee, Youngtaek, Park, Jung-Dong, Shin, Changhwan
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Year:
2016
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2016.2574328
File:
PDF, 3.55 MB
english, 2016
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