SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle
Panning, Eric M., Goldberg, Kenneth A., Ko, Ki-Ho, Mo, Soo-Yeon, Kim, In-Seon, Oh, Hye-KeunVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2220155
File:
PDF, 1.22 MB
english, 2016