SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - OPC recipe optimization using genetic algorithm
Erdmann, Andreas, Kye, Jongwook, Asthana, Abhishek, Wilkinson, Bill, Power, DaveVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2219166
File:
PDF, 1.04 MB
english, 2016