![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation
Mbanaso, Chimaobi, Schellenberg, Frank M., Denbeaux, Gregory, Dean, Kim, Brainard, Robert, Kruger, Seth, Hassanein, ElsayedVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772695
File:
PDF, 306 KB
english, 2008